20549 Microelectronic Technologies
Credits: 3 advanced seminar credits in Electronics or in Chemistry
Prerequisites: 36 credits in the Sciences, including Semiconductors, Semiconductor Devices and Microelectronics, Differential and Integral Calculus I (or Infinitesimal Calculus I). Students must also fulfill all English requirements and take bibliographic instruction in the Library.
Authors: Gady Golan, Yoram Kirsh
The course introduces students to microelectronics processing systems, materials in microelectronics, and physical and chemical phenomena of thin films.
Topics: Vacuum systems – types of vacuum technologies needed in the microelectronics industry; Photolithography – photography and development techniques of miniaturized masking on wafers; CIM techniques – computer-aided design and manufacturing of transistors on semiconductor bases; Evaporation of metals (complete process) and thin-film deposition for microelectronics; Sputtering of metals (complete process) and thin-film deposition for microelectronics; Crystal growth and epitaxy – techniques for growing crystals in thin film (epitaxy) or in cylinders; Thin film oxidation processes in producing insulators; Diffusion and ion implantation – doping semiconductor bases with various dopants; Corrosion – “milling” and “sawing” techniques in thin films.
Seminar paper topics: Thermal evaporation technologies; molecular-beam epitaxy – MBE; ionic sputtering; chemical evaporation in the gas phase; chemical evaporation in the liquid phase; ion implantation; thermal oxidation; electrolytic anodization; vapor deposition; immersion coating; liquid phase epitaxy; application-based criteria for selecting thin film; silicone epitaxy in chemical vapors; instrumentation considerations during epitaxy; defects in epitaxy layers; evaluating results and automatic data collection.
1or General Chemistry (20477 or 20487), which is no longer offered.